Nitrogen dissociation in low-pressure microwave plasmas

Quantification of the VUV radiation in low pressure hydrogen and nitrogen plasmas

Hydrogen and nitrogen containing discharges emit intense radiation in a broad wavelength region in the VUV. The measured radiant power of individual molecular transitions and atomic lines between 117 nm and 280 nm are compared to those obtained in the visible spectral range and moreover to the RF power supplied to the ICP discharge. In hydrogen plasmas driven at 540 W of RF power up to 110 W ar...

Controlling VUV photon fluxes in low-pressure inductively coupled plasmas

Low-pressure (a few to hundreds of millitorrs) inductively coupled plasmas (ICPs), as typically used in microelectronics fabrication, often produce vacuum-ultraviolet (VUV) photon fluxes onto surfaces comparable to or exceeding the magnitude of ion fluxes. These VUV photon fluxes are desirable in applications such as sterilization of medical equipment but are unwanted in many materials fabricat...

The importance of ions in low pressure PECVD plasmas

*Correspondence: Andrew Michelmore, Mawson Institute, Building V, Mawson Lakes Campus, University of South Australia, Mawson Lakes, 5095, SA, Australia e-mail: andrew.michelmore@ unisa.edu.au Plasma enhanced chemical vapor deposition (PECVD) can be used to fabricate surfaces with a wide range of physical and chemical properties and are used in a variety of applications. Despite this, the mechan...

Theory and simulation of anode spots in low pressure plasmas

Atom and ion chemistry in low pressure hydrogen dc plasmas.

The chemical composition of a low-pressure hydrogen dc plasma produced in a hollow cathode discharge has been measured and modeled. The concentrations of H atoms and of H(+), H(2)(+) and H(3)(+) ions were determined with a combination of optical spectroscopic and mass spectrometric techniques, over the range of pressures (p approximately 0.008-0.2 m bar) investigated. The results were rationali...